MNF | Activity
MNF activity is based on two synergic topics:
Microfabrication: design, development, prototyping, production and packaging of innovative devices based on silicon technology, with a focused expertise on radiation sensors, environmental sensors, micro-mechanical devices for transduction, particle detection, RF-technologies, optics. With more than 20 years of experience, the complete development cycle of advanced micro devices is covered for both R&D and production. The core technology platforms are:
- Ultra-low leakage planar devices
- Wafer-through doped structures
- Bulk MEMS
- Surface MEMS
Nanofabrication: With extensive expertise, the full development cycle of nanoscale systems is supported, from concept to fabrication for R&D. The facility provides access to high-resolution nanofabrication platforms, including:
- Advanced stepper lithography
- Electron Beam Lithography (EBL)
- Nano-Focused Ion Beam (multispecies) technologies
In this scenario we perform both research and development and service activities for external customers and partners.
MNF laboratories
Cleanroom dedicated to silicon based radiation sensors and integrated photonics. The cleanroom is in class 100. The lithography bay is in class 10. Minimum feature size 3um (double side mask aligner), 350nm (stepper), 10nm (EBL). Being dedicated to radiation sensors, metals are limited to aluminum and titanium.
Cleanroom dedicated MEMS and NEMS. The cleanroom is in class 1000. The lithography bay is in class 100. Minimum feature size 1um (mask aligner). Nanofabrication oriented dual beam system (feature sizes 20nm).
Clean room dedicated to 3D integration technology. The lab is divided into two areas focused on the grinding and bonding/debonding processes respectively. The lab is compatible with 6-8 inch processes.
The Functional Test Lab hosts four test-benches aimed at microchip electrical characterization, PCB assembly and testing, and one climatic chamber for temperature characterization. Every bench is equipped with several power supplies, oscilloscopes, digital and analog acquisition boards. A dedicated testbench is set up for measurement and characterization of TeraHertz detectors up to 1.1THz frequency.